Products

With the increasing level of high performance and integration of super LSI devices and other IC products in the semiconductor industry, dry-etching gases are in high demand for use in ultrafine fabrication. UBE was the first company to produce boron trichloride in Japan, and it is of the highest quality and purity, making a perfect choice for a dry-etching gas for aluminum wires.

Full-fledged application of compound semiconductors to optoelectronics, HEMT, and GaAs ICs is underway, and metal organic chemical vapor deposition (MOCVD) is being used as an epitaxial crystal growth method. UBE's MO compounds are highly rated for their extremely high purity made possible by our refining, analysis, and handling technology accumulated as a chemical manufacturer. Our company is now achieving one success after another in the III-V and III-VI family of metal organic chemical vapor deposition (MOCVD) materials.

MOCVD and atomic layer deposition (ALD) are used for forming thin film layers in the field of electronics and semiconductors. UBE has a lineup of new metal complex materials that have a low melting point and are nonflammable in air, including copper materials for wiring, ruthenium and platinum materials for electrodes, transparent conductive coatings, zinc materials for zinc oxide that were developed for light-emitting elements, and aluminum materials.

With the increasingly high integration and miniaturization of semiconductor devices, there has been a growing demand for even higher quality and higher purity aqueous ammonium, which is used to clean silicon wafers. UBE's high-purity aqueous ammonium is a high-grade product with virtually no metal ion particles thanks to our integrated manufacturing under stringent quality control that covers everything from raw material refining to manufacturing and packaging.

UBE's high-purity nitric acid is a highly refined product developed for the electronics industry after accumulating vast amounts of study and research data gathered during manufacturing experiments on a variety of nitric acid products over the years. It is the perfect product for cleaning and etching silicon wafers.

With the increasingly high integration and miniaturization of semiconductor devices, there has been a growing demand for even higher quality and higher purity sulfuric acid, which is used to clean silicon wafers and strip off resist. UBE's high-purity sulfuric acid is a high-grade product with virtually no metal ion particles thanks to our integrated manufacturing under stringent quality control that covers everything from raw material refining to manufacturing and packaging.